Tungsten trioxide electrochromic film for smart window can be prepared by magnetron sputtering method. You may know that magnetron sputtering method is a multi-field film preparation method that is easy to be used in the laboratory for study and is also suitable for large-scale production. But do you know the basic method of preparing WO3 electrochromic thin film by magnetron sputtering?
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The basic method for preparing WO3 electrochromic thin film by magnetron sputtering method is as follows: W or WO3 is used as the target, and the working gas is Ar or a mixture of Ar and O2. By applying high pressure, an abnormal glow discharge is generated on the surface of the target. The plasma is confined by a magnetic field, so that the Ar+ ions bombard the target at energy of 500eV, and the atoms and clusters are separated from the surface of the target in an ion form, thereby depositing a uniform WO3 film on the surface of the substrate.
