Mo doping tungsten oxide electrochromic thin film can be prepared by magnetron sputtering. As you may have known, magnetron sputtering is a fast technique for applying a thin layer of inorganic materials on a substrate, such as ITO or metallic contacts. Experts said that when using a magnetron sputtering method to prepare a Mo-doped tungsten oxide electrochromic film, other non-stoichiometric WOx targets can be adopted and the sputtering parameters can be further optimized to obtain electrochromic film with more excellent electrochromic performance.
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Further, in order to make the doped tungsten oxide electrochromic film have better cycle stability, the substrate can be heated during sputtering to eliminate oxygen vacancies. Besides, when magnetron sputtering is used to prepare nickel oxide electrochromic film, a nickel target doped with chromium or manganese can be used instead of the high-purity nickel target to obtain a doped nickel oxide film, thereby improving electrochromic performance. Similarly, during sputtering, the substrate can also be heated to eliminate oxygen vacancies, so that the film will have better cycling stability.
